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THERMAL OXIDE SILICON WAFERS Services Main | Thermal Oxide
 

Some customers will require a layer of SiO2 or silicon dioxide on their silicon wafers in order to create an electrical insulation layer on the bare silicon. These kinds of silicon wafers are referred to as Thermal Oxide silicon wafers because the SiO2 oxide layer is thermally grown at high temperature to a desired thickness on both sides of the wafer.

WaferNet stocks 200mm and 300mm Thermal Oxide Silicon Wafers in our inventory in standard 1,000 angstrom and 5,000 angstrom SiO2 thicknesses as a turn-key wafer and film solution for our customers. These are in stock and can usually ship the same day from our warehouse in San Jose, California.

Should you have a need for thermal oxide silicon wafers in other diameters or other thicknesses as thin as 140 angstroms or as thick as 15 microns, please contact us and let us know what you need by submitting a Service Request form or calling us at 1-866-WAFERNET.

 
Dia (mm) Type Grade Resistivity
(ohm-cm)
Thickness
(um)
Frontside Backside Flats Oxide
Thickness
Action
200 N/P Films 0.0 - 100.0 675 - 775 Polished Etched Notch 1,000 angstroms Quick Quote
200 N/P Films 0.0 - 100.0 675 - 775 Polished Etched Notch 5,000 angstroms Quick Quote
300 N/P Films 0.0 - 100.0 750 - 800 Polished Etched Notch 1,000 angstroms Quick Quote
300 N/P Films 0.0 - 100.0 750 - 800 Polished Etched Notch 5,000 angstroms Quick Quote
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